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The Relyon Plasma PB3 Plasmabrush from Intertronics offers convenient, high speed, high performance atmospheric plasma cleaning and surface activation.
According to Intertronics, the PB3 Plasmabrush is a nozzle-type plasma generator which is particularly compact and offers long-term stability. Proprietary Pulsed Atmospheric Arc Technology uses a unipolar pulsed high voltage source and a vortex flow in the nozzle which delivers uniform high power density with only minimal warming of the nozzle and hardly any erosion of the electrodes.
Intertronics explains that the use of atmospheric plasmas for industrial applications has become widespread in many different sectors. Pre-treating or activation of surfaces prior to bonding, coating or laminating is readily achieved using atmospheric gases, rather than wet chemical primers. At the same time, the cleaning action of the plasma can remove residues from release agents, lubricants or cleaning agents left on surfaces. Atmospheric plasma cleaning is a dry, non-contact, non-abrasive cleaning process.
The PB3 Plasmabrush is able to be integrated into continuous production processes due to a compact and lightweight, modular design and the adaption of the PS2000 high voltage power supply to the CanOpen industrial standard communication protocol. Intertronics says that the system supplies meaningful digital data from which valuable process information can be gained. It offers precision for fine detail areas over-complex 3D shapes and is gentle enough to treat even thin textiles or delicate materials including porous substrates and foams – large areas may be treated remarkably quickly.
The PB3 Plasmabrush is used for applications such as cleaning/activation of metals, glass and plastics for optimum wettability of coatings, inks, etc., and preparation prior to sealing or bonding. More specialised projects have included the bleaching of textiles without the use of chemicals, and plasma sterilisation of fabrics and thermally sensitive plastic materials.
Image provided by Intertronics
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